Quartzware used in film deposition processes is subject to being coated with the deposit materials. The accumulation of
film thickness will create stress to the film and its underlying quartz material due to the mismatch of thermal expansion
coefficient, which can eventually lead to particle generation in the system. One way to address this issue is to clean the
quartzware on a regular basis to remove the deposited film. This results in a downtime of the system and an eventual
replacement of the quartzware as quartz material is also being removed in the cleaning process.
Texturing the surface of the quartzware provides an innovative way to reduce the particle generation and to increase the lifetime of the
quartzware. After this pre-treatment to the quartzware surface, the adhesion of deposited material to the underlying quartzware is
improved and thus, a thicker film without particle generation can be achieved. This translates to less frequent cleaning and longer quartz
life. Following Momentive Performance Materials’ guidelines, United Silica Products can optimize the surface of the quartz product to
fulfill customer specific requirements and help reduce the cost of ownership.
